Vacuum Solutions
Bekaert is specialized in the design and construction of tailor-made vacuum equipment, not only for the members of the Bekaert Group, but also for third-party customers which are active in a wide variety of industrial segments.
- Architectural glazing
- heat-reflective, low-e
- electrochromic, solar control coating
- Web coatings
- Tool coatings
- Pre-products for LCD's
- Semiconductor industry (more than 30% of all production steps rely on plasma processing)
Working closely with those industries Bekaert is extending the horizons of the technology by tirelessly seeking new solutions and opportunities.
The customer is closely involved at all stages in the design and execution of the project. This approach achieves superior vacuum solutions and ensures that the equipment is tailored to the customer's needs, giving the customer a competitive edge.
Lamp sputter coater
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"Lamp sputter coater for
deposition of a reflective
metal coating on glass
reflectors."
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Advantages and options
- uniform deposition on curved substrates
- various process steps without vacuum break
- degas
- plasma clean
- sputter deposition
- flexibility in substrate dimension
- high layer quality
- good reproducibility
- high throughput (less than 1 minute per batch)
- high MTBF, low down-time
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Vacuum web coater |
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PACVD DLN coater |
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"Vacuum web coater for deposition of
sputtered thin films on flexible substrates."
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"PACVD DLN coater for deposition of
diamond-like nanocomposite coatings
on various substrates." |
R&D vacuum systems
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Multipurpose R&D vacuum system with
- standard 19" cabinet
- vacuum chamber : 450 mm x 450 mm x 450 mm
- manually operated door with viewport
- standard dual stage rotary vane pump
- pirani gauge
- PLC with operator interface
Can be equiped with
- other vacuum pumps
- sputter source(s) and power supplies
- substrate carrier
- substrate heater
- throttle valve
- mass flow controllers
- other plasma sources
- etc ...
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"Multipurpose R&D
vacuum system." |
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"Multipurpose R&D vacuum
system for analysis of samples." |
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Sources
- CVD (Chemical Vapour Deposition)
- plasma assisted CVD (low substrate
temperatures)
- liquid or gaseous precursors
- electron source and electro magnet
- PVD (Physical Vapour Deposition)
- magnetron sputtering (up to 10 kW)
- resistance evaporation (up to 400 A and
water-cooled electrodes)
- Infrared heating (up to 700° C)
Substrate setup, simultaneous
- DI water cooling
- RF power supply
- rotating/planetary system
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